{"id":6465,"date":"2024-01-26T17:51:04","date_gmt":"2024-01-26T08:51:04","guid":{"rendered":"https:\/\/rdec.co.jp\/update\/?post_type=products_en&p=6465"},"modified":"2025-09-12T11:15:30","modified_gmt":"2025-09-12T02:15:30","slug":"ads-e86","status":"publish","type":"products_en","link":"https:\/\/rdec.co.jp\/update\/products_en\/6465","title":{"rendered":"ADS-E86"},"content":{"rendered":"\n

Recipe Controlled Automatic Evaporation System<\/strong><\/p>\n\n\n\n

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Product Information<\/strong><\/h4>\n\n\n\n
Overview<\/strong><\/h5>\n\n\n\n

Features<\/strong><\/p>\n\n\n\n

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  • High pumping speed: From atmospheric pressure to E-3Pa within 3minutes <\/strong>(load lock chamber)<\/li>\n\n\n\n
  • One-click<\/strong> of the \u201cSTART\u201cbutton after recipe selection for fully automatic control from vacuum pumping to completing deposition.<\/li>\n\n\n\n
  • No limit to the number of processes and deposition layers<\/strong> for recipe control software<\/li>\n\n\n\n
  • Compact and space-saving<\/strong> with original wafer transport mechanism<\/li>\n\n\n\n
  • Easy Maintenance<\/strong> with a large front hatch installed in the deposition chamber.<\/li>\n\n\n\n
  • Stable deposition even at low rates <\/strong>(Au and Al 0.1 \u00c5\/sec)<\/li>\n\n\n\n
  • Substrate cooling system <\/strong>for lift-off process<\/li>\n\n\n\n
  • \u201c<\/strong>Equipped with a 23-inch wide monitor for visibility and operability<\/strong><\/li>\n<\/ul>\n\n\n\n
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